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Inductively Coupled Plasma Etcher for Nanophotonics, Nanoelectronics and MEMS devices

Project Member(s): Poulton, C., Arnold, M.

Funding or Partner Organisation: Australian Research Council (ARC Linkage Infrastructure)

Start year: 2015

Summary: The LIEF etcher removes, with sub-nanometre precision, material from a planar Silicon substrate in accord with a pattern produced by optical or electron lithography. The etcher will enable researchers in photonics (Eggleton, Palomba, Kuhlmey) to fabricate nanostructured metamaterials, photonic crystals, and nano-mechanical resonators that are essential for research in CUDOS and in Eggleton┬┐s Laureate Fellowship. Reilly and colleagues will fabricate nanometre-scale electronic devices in which spins of individual electrons can be controlled for quantum computing research. With the opening of the Australian Institute of Nanoscience in 2015 the etcher will become part of an integrated nanofabrication facility built around electron and optical lithography.

Keywords: nanophotonics, fabrication, integrated optics, nonlinear optics, optomechanics, plasmonics

FOR Codes: Nanofabrication, Growth and Self Assembly, Expanding Knowledge in Technology, Expanding Knowledge in the Physical Sciences, Fixed Line Data Networks and Services, Nanoelectronics, Nanophotonics