Electron assisted atomic layer and chemical vapour deposition of silver and gold nanostructures for applications in plasmonics and catalysis
Project Member(s): Lobo, C.
Funding or Partner Organisation: DAAD Germany (UA DAAD)
DAAD Germany (UA DAAD)
Start year: 2020
Summary: This project aims to develop new processes for nanoscale deposition of silver (Ag) using a unique combination of thermal and electron beam chemistries. The German and Australian project leaders have highly complementary expertise in these areas, and have previously held a joint DAAD grant on “Novel purification strategies for materials fabricated by electron-induced deposition”. Prof. Dr. Swiderek is an expert in surface science and electron induced chemistry, and A. Prof. Lobo has experience in both thermal and electron induced dissociation and growth processes, such as chemical vapour deposition, atomic layer deposition, and focused electron induced processing. A. Prof. Lobo has also recently been using focused electron beams in an environmental scanning electron microscope (ESEM) to achieve high resolution surface functionalization and etching of advanced semiconductor and optoelectronic materials, including the two-dimensional materials black phosphorus (BP) and hexagonal boron nitride (hBN). The goals of the research project will be achieved by translating the Bremen group’s understanding of the fundamental mechanisms of electron beam reactions to optimizing the growth rates and purities of focused electron beam assisted ALD and CVD reactions (work to be conducted at UTS, Sydney).
FOR Codes: Materials Engineering, Expanding Knowledge in the Physical Sciences